Correlation of local structure and electrical activation in arsenic ultrashallow junctions in silicon
Journal of Applied Physics, 104(10), 103716/1- 103716/8, November 2008
Stephen P. Kelty, Ph.D.
Department of Chemistry and Biochemistry
D. Giubertoni, G. Pepponi, S. Gennaro, M. Bersani, M. A. Sahiner, R. Doherty, M. A. Foad, M. Kah, K. J. Kirkby, J. C. Woicik & P. Pianetta
This study aims to correlate between the results of electrical activation measurements and x-ray absorption fine structure measurements.